Blanket Wafers

ALD Films

*deposited ALD HfO2 followed by Nitridation process

ALD Blanket Wafers
ALD Film TypeWafer SizeThickness Range AvailableThickness ToleranceTemperature
(ºC)
Al2O3200mm, 300mm5 – 1000 Å+ / – 5%330/470
HfO2200mm, 300mm5 – 200 Å+ / – 5%330
HfON*200mm, 300mm5 – 200 Å+ / – 5%330
HfSiO2200mm, 300mm5 – 200 Å+ / – 5%330
HfSiON*200mm, 300mm5 – 200 Å+ / – 5%330
SiN200mm, 300mm10 – 350 Å+ / – 5%450
SiO2200mm, 300mm10 – 150 Å+ / – 5%470
Ta2O5200mm, 300mm5 – 200 Å+ / – 5%330
TaCN200mm, 300mm100 – 150 Å+ / – 5%330
TiN200mm, 300mm20 – 200 Å+ / – 5%500
ZrO2200mm, 300mm5 – 200 Å+ / – 5%330
CVD Blanket Wafers
CVD Film TypeWafer SizeThickness Range AvailableThickness ToleranceRefractive IndexTemperature
(ºC)
Process
Amorphous Silicon200mm500 – 20,000 Å+/- 5%NA200, 350PECVD
Coral200mm, 300mm500 – 20,000 Å+/- 5%1.4 +/- 0.06400PECVD
SiC200mm, 300mm50 – 10,000 Å+/- 5%1.5 – 2.0400PECVD
SiCN200mm, 300mm500 – 10,000 Å+/- 5%NA370, 400PECVD
SiCO200mm, 300mm300 – 5,000 Å+/- 5%NA400PECVD
Silox200mm, 300mm500 – 20,000 Å+/- 5%1.46 +/- 0.05400PECVD
SiN200mm, 300mm120 – 20,000 Å+/- 5%2.01 +/- 0.14400PECVD
SiON200mm, 300mm500 – 10,000 Å+/- 5%1.8 +/- 0.1400PECVD
TEOS200mm, 300mm500 – 20,000 Å+/- 5%1.46 +/- 0.05400PECVD
TiN200mm100 – 600 Å+/- 5%NA340MoCVD
TiSiN200mm100 – 600 Å+/- 5%NA340MoCVD
W200mm1,000 – 6,000 Å+/- 5%NA415CVD
LPCVD Blanket Wafers
LPCVD Film TypeWafer SizeThickness Range AvailableThickness ToleranceRefractive IndexTemperature (ºC)Stress
Amorphous Silicon200mm, 300mm250Å – 1.1μ+/- 5%4.41530variable based on dep conditions
Oxide200mm100Å – 2μ+/- 5%1.458715textless 250 MPa Compressive
Polysilicon200mm, 300mm300Å – 2μ+/- 5%3.87620
Silicon Nitride200mm200Å – 0.75μ+/- 5%2.00 +/- 0.02775﹥ 1K MPa Tensile
Thermal Oxides Blanket Wafers
Thermal Oxide TypeWafer SizeThickness Range AvailableThickness ToleranceRefractive IndexTemperature
(ºC)
Dry ﹤ 500 Å200mm, 300mm20 – 500 Å+/- 10%1.458800 – 1,100
Dry ﹥ 500 Å200mm, 300mm500 – 3,000 Å+/- 5%1.458800 – 1,100
Dry Chlorinated ﹤ 500 Å200mm, 300mm20 – 500 Å+/- 10%1.458800 – 1,100
Dry Chlorinated ﹥ 500 Å200mm, 300mm500 – 3,000 Å+/- 5%1.458800 – 1,100
Wet200mm, 300mm1,000 – 3μ+/- 5%1.458800 – 1,100

PVD Films

*All depositions listed at 22ºC are uncontrolled set points and will have some variability.

PVD Blanket Wafers
PVD Film TypeWafer SizeThickness Range AvailableThickness ToleranceTemperature
(ºC)
Al200mm, 300mm20 – 1,000 Å+/- 10%22*
AL 0.5% Cu200mm500 – 10,000 Å+/- 10%300
Co200mm200 – 2,000 Å+/- 10%300
Co200mm, 300mm50 – 500 Å+/- 10%22*
Cu200mm, 300mm500 – 2,000 Å+/- 10%-40, -50
Hf200mm, 300mm50 – 500 Å+/- 10%22*
Mo200mm, 300mm50 – 500 Å+/- 10%22*
Ni200mm100 – 600 Å+/- 10%50
Ni200mm, 300mm50 – 500 Å+/- 10%22*
Pt200mm, 300mm50 – 500 Å+/- 10%22*
Ru200mm, 300mm50 – 500 Å+/- 10%22*
Si200mm, 300mm50 – 500 Å+/- 10%22*
SiN200mm, 300mm50 – 500 Å+/- 10%22*
Ta200mm50 – 1,000 Å+/- 10%-50
Ta200mm50 – 500 Å+/- 10%-20
Ta200mm, 300mm50 – 500 Å+/- 10%22*
TaN200mm50 – 500 Å+/- 10%-50
TaN200mm50 – 500 Å+/- 10%-20
TaN200mm, 300mm50 – 500 Å+/- 10%22*
Ti200mm300 – 2,000 Å+/- 10%300
Ti200mm, 300mm50 – 500 Å+/- 10%22*
Ti Collimated200mm250 – 1,000 Å+/- 10%250
TiN200mm, 300mm50 – 500 Å+/- 10%22*
TiN Collimated200mm250 – 1,000 Å+/- 10%250
TiO2200mm, 300mm20 – 50 Å+/- 10%22*
W200mm, 300mm50 – 500 Å+/- 10%22*
Zr200mm, 300mm50 – 500 Å+/- 10%22*
Spin Coating Blanket Wafers
Spin Coat TypeWafer SizeTypeThickness Range AvailableWiW Range
AZ nLOF Photoresist200mmbroadband7.0 – 9.0μ﹤ 0.35μ
248nm Bottom Anti-Reflective Coating200mmKrF600 – 900 Å﹤ 20 Å
193nm Bottom Anti-Reflective Coating200mm, 300mmArF600 – 800 Å﹤ 20 Å
Dow SPR220 Photoresist200mmbroadband2.3 – 10.0μ﹤ 0.35μ
Dow UV210 Photoresist200mmKrF2,600 – 4,600 Å﹤ 50 Å
Dow UV6 Photoresist200mmKrF6,000 – 13,000 Å﹤ 120 Å
Dow UV26 Photoresist200mmKrF19,000 – 54,000 Å﹤ 900 Å
TOK TArF-P629 Photoresist200mm, 300mmArF1,100 – 1,900 Å﹤ 30 Å
TOK TarF-P7067 Photoresist200mm, 300mmArF2,700 – 4,000 Å﹤ 30 Å
TOK TArF-P6100 Photoresist200mm, 300mmArF2,900 – 5,400 Å﹤ 50 Å
TOK iN057 Photoresist200mmbroadband3.0 – 7.0μ﹤ 0.35μ
TOK PMER P-CR4000 PM200mmbroadband14.0 – 16.0μ﹤ 0.35μ
Microchem SU-8 Photoresist200mmbroadbandrequestrequest
Microchem PMGI Liftoff Underlayer200mmNArequestrequest
HD MicroSystems PI-2610 Polyimide
200mmNArequestrequest
HD MicroSystems HD8820 Photodefinable Polyimide200mmbroadbandrequestrequest
Contact

Reuben SantanaSales Operations

512.356.2321 (phone) 512.356.2232 (fax)

Lesli RoushSales Operations

512.356.2322 (phone) 512.356.2232 (fax)

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